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Which consequence results when a pulsed laser deposits excessive energy unevenly onto a silicon wafer?

A)Increased grain boundary passivation
B)Laser-induced backside wrap-through occurs
C)Thermionic emission gets enhanced locally
D)Epitaxial regrowth creates a monocrystal

💡 Explanation

Laser-induced backside wrap-through occurs because localized thermal stress exceeds yield strength, leading to wafer distortion, rather than uniform heating optimizing grain boundaries. The underlying mechanism is thermal shock propagation, therefore backside defects appear rather than surface passivation under controlled annealing.

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