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Which consequence results when an NMOS transistor’s gate dielectric strength exceeds the theoretical limit?

A)Increased reverse saturation current
B)Gate oxide quantum tunneling occurs
C)Channel length modulation increases
D)Subthreshold leakage reduces sharply

💡 Explanation

Gate dielectric breakdown causes quantum tunneling because the electron can tunnel through the thin oxide layer given a sufficient electric field. Therefore, it leads to current leakage rather than other classical effects under normal operation.

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