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← ScienceWhich consequence results when electron concentration exceeds gate oxide tolerance?
A)Capacitance threshold voltage shifts negatively✓
B)Substrate channel resistance decreases linearly
C)Gate-induced drain leakage diminishes rapidly
D)Interface trap density is maximally reduced
💡 Explanation
Electron injection into the gate oxide results from high concentration, because Fowler-Nordheim Tunneling allows electron transfer beyond the potential barrier, therefore the threshold电压 shifts due to induced charge, rather than the channel widening affecting resistance.
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