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Which consequence results when excessive gate oxide thinning occurs in flash memory cells?

A)Increased electron quantum tunneling
B)Reduced data retention duration
C)Elevated channel hot carrier injection
D)Decreased parasitic capacitance effect

💡 Explanation

Increased gate oxide thinning promotes electron quantum tunneling from the floating gate because the potential barrier width decreases, therefore stored charge leaks more rapidly, rather than slower leakage from other degradation mechanisms.

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