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Which consequence results when gate oxide breakdown occurs in flash memory?

A)Data retention becomes increasingly unreliable
B)Write speeds greatly increase linearly
C)Cell threshold voltage becomes stable
D)Erase cycles require less energy

💡 Explanation

When gate oxide breaks down, electrons tunnel through the damaged oxide layer, leading to charge leakage because of Fowler-Nordheim tunneling. Therefore, data retention degrades rather than improving threshold stability or write speeds, which require intact insulation.

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