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Which consequence results when gate oxide degradation increases?

A)Increased quantum tunneling leakage
B)Reduced channel carrier mobility
C)Higher threshold voltage stability
D)Improved subthreshold swing performance

💡 Explanation

Increased gate oxide degradation enhances the probability of electron quantum tunneling through the oxide layer, because a thinner effective barrier accelerates the tunneling mechanism, therefore increasing gate leakage current, rather than improving transistor performance.

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