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Which consequence results when gate oxide scales down excessively?

A)Increased gate leakage current
B)Reduced channel mobility
C)Higher threshold voltage
D)Lower breakdown voltage

💡 Explanation

Excessive gate oxide scaling causes increased leakage, because electrons tunnel through the thinner oxide layer via quantum tunneling. Therefore, gate leakage increases sharply, rather than mobility decreasing or threshold voltage changing, because the oxide is still primarily an insulator.

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