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Which consequence results when oxides compromise transistor gate?

A)Increased gate leakage current occurs
B)Reduced channel mobility results
C)Threshold voltage shifts unexpectedly
D)Substrate doping concentration increases

💡 Explanation

Increased gate leakage current occurs via quantum tunneling through the thin oxide layer due to defects. This lowers the transistor's efficiency because current flows without proper gate control, therefore reducing power. Channel mobility decreases from larger oxide defects rather than tunneling.

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