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Which consequence results when thermally grown silicon dioxide layers become ultra thin?

A)Increased gate leakage current
B)Reduced channel mobility
C)Lower transistor transconductance
D)Increased subthreshold swing

💡 Explanation

Increased gate leakage current occurs because of quantum mechanical electron tunneling through the thin oxide. The tunneling probability increases exponentially as the oxide thickness decreases; therefore, gate leakage increases rather than parameter improvements because thin oxides have larger electric fields.

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