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Which consequence when imperfections disrupt coherence within microchip lithography?

A)Reduced feature resolution on the wafer
B)Increased photoresist layer uniformity achieved
C)Enhanced diffraction at mask edges seen
D)Lower energy consumption during wafer exposure

💡 Explanation

Reduced feature resolution arises because disrupted coherence degrades the projection of the mask pattern onto the wafer via the **loss of constructive interference**. Therefore, resolution drops, rather than uniformity improving, because incoherent light scatters rather than focusing properly.

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