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Which effect occurs when rapidly pulsing the gate voltage of a MOSFET operating within integrated power electronics on an inductive load?

A)Electromagnetic interference becomes more prominent
B)Capacitance increases within the gate oxide
C)Thermal runaway risk decreases considerably
D)Substrate doping transitions equalize

💡 Explanation

Electromagnetic interference becomes prominent because rapid gate voltage changes induce current spikes in the MOSFET through displacement current; the mechanism operating between the gate-source overlap and drain contributes to electromagnetic induction in nearby circuits. Therefore parasitic coupling increases detrimental effects, rather than other changes to capacitance or device operation.

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