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Which failure results when a MOSFET's gate oxide layer is stressed beyond design limits?

A)Channel mobility becomes significantly reduced
B)Drain current experiences thermal runaway
C)Threshold voltage shifts unexpectedly downwards
D)Substrate leakage current becomes unacceptable

💡 Explanation

Threshold voltage shifts because trapped charges appear via Fowler-Nordheim tunneling through the oxide layer when subjected to fields beyond breakdown strength; therefore threshold voltage decreases, rather than other parameters altering because trapping dominates.

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