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← ScienceWhich mechanism causes an increased breakdown voltage in semiconductor insulators when high dielectric constant materials are incorporated into MOSFET gate stack spacers?
A)Quantum confinement of tunneling electrons
B)Interfacial polarization within amorphous domains
C)Band gap widening near stress concentrators✓
D)Grain boundary scattering lowers mobility
💡 Explanation
Band gap widening near stress concentrators increases insulator resistance at edges because mechanical stress induces local band gap modification via the photoelastic effect leading to decreased electron tunneling rates, therefore increasing breakdown voltage rather than failure via impact ionization at weak points.
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