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Which mechanism causes reduced electron mobility when crystalline silicon contains grain boundaries?

A)Schottky barrier formation
B)Phonon scattering increase
C)Impurity segregation offset
D)Interface state trapping

💡 Explanation

Interface state trapping reduces electron mobility because dangling bonds create energy states within the silicon band gap that trap carriers. Trapping limits mobility via temporary immobilization, rather than phonon scattering increase that occurs uniformly with temperature.

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