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Which mechanism fundamentally limits resolution in extreme UV lithography using coherent laser light?

A)Laser-induced damage threshold reduction
B)Photoresist chemical amplification saturation
C)Diffraction exceeding the Rayleigh criterion
D)Vacuum contamination reduces beam intensity

💡 Explanation

Diffraction fundamentally limits resolution because limitations on minimum feature size occurs due to the wave nature of light, wherein the Airy disk broadens, therefore diffraction determines resolution limits rather than material properties that affect contrast.

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