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Which mechanism limits electron mobility in complementary metal-oxide-semiconductor transistor circuits with high doping concentrations?

A)Phonon scattering from lattice vibrations
B)Impact ionization from high electric fields
C)Impurity scattering from ionized dopants
D)Quantum tunneling through the gate oxide

💡 Explanation

With high doping, increased ionized impurity scattering occurs because abundant dopant ions interact with electron pathways, deflecting them efficiently according to the coulombic force, reducing momentum transfer and mobility. Therefore impurity scattering is greatest, rather than phonon scattering, impact ionization or tunneling, which are caused by either lattice vibration, strong acceleration, or thin barriers.

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