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Which outcome causes the limited resolution in optical lithography?

A)Diffraction causes feature size limits
B)Aberration reduces the contrast ratio
C)Reflection creates standing wave artifacts
D)Refraction induces pattern placement errors

💡 Explanation

When light passes through the mask aperture, diffraction causes wavefront divergence hindering imaging of features smaller than the Rayleigh criterion; therefore resolution is limited by this diffraction, rather than by pattern errors, because aberrations affect contrast.

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