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Which outcome impairs flash memory cell endurance when threshold voltages shift?

A)Oxide trap electron tunneling occurs
B)Increased channel hot carrier injection
C)Decreased Fowler-Nordheim gate current
D)Reduced source-drain series resistance

💡 Explanation

Oxide trap creation results from electrons tunneling into the gate oxide. The increased charge causes the programmed threshold voltage to change because repeated programming stresses the insulator; therefore memory fails, rather than another degradation effect like channel resistance reduction.

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