Which outcome jeopardizes the writing precision of an EUV lithography system?

💡 Explanation

Reduced beam coherence smears the projected mask image because the **interference** fringes become indistinct, therefore line edge roughness increases, rather than achieving crisp lines; stochastic photon arrival contributes noise but isn't primary.

• Which outcome occurs when imperfections increase in interferometer mirrors?
• Which mechanism causes increased neutron flux in Uranium-235 enrichment?
• Which risk significantly increases when the liquid-vapor transition occurs rapidly in a pump?
• Which mechanism prevents electron transport in intrinsic crystals?
• Which outcome occurs when a silica catalyst's Lewis acidic sites insufficiently hybridize?
• Which outcome occurs when atmospheric turbulence reduces coherence across a laser beam used in free-space optical communication?