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← ScienceWhich outcome limits CMOS transistor miniaturization using extreme ultraviolet?
A)Quantum tunneling increases off-state leakage✓
B)Electromigration causes interconnect failures
C)Hot carrier injection degrades threshold voltage
D)Capacitive coupling decreases switching speed
💡 Explanation
Quantum tunneling becomes significant as gate oxide thickness decreases because electrons can tunnel through the insulating layer via Quantum tunneling, therefore off-state leakage increases, rather than electromigration or hot carrier injection, which are reliability concerns under high current or voltage stress.
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