Which outcome occurs when a plasma etcher's RF power exceeds thermal limits?

💡 Explanation

Increased RF power leads to excessive process gas dissociation via collisional excitation, therefore generating more reactive radicals, and intensifying surface reactions to form more volatile byproducts, rather than stabilizing the plasma as would occur normally.

• Which material property causes hysteresis losses in each magnetic cycle of a transformer core?
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• Which risk increases when conjugated molecules absorb broadband light?
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