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Which outcome occurs when multiple coherent ArF laser beams create a holographic pattern in a photoresist layer during semiconductor manufacturing?

A)Sub-resolution feature printing anomaly
B)Increased resist plasma etch resistance
C)Augmented conformal deposition of metals
D)Superior critical width dimension uniformity

💡 Explanation

Sub-resolution feature printing anomalies occur, because constructive and destructive interference leads to unexpected intensity variations causing unwanted pattern formations. This localized variation happens, therefore an effective aerial image can not be properly replicated, rather than a uniform pattern transfer achieved.

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