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โ TechnologyWhich outcome occurs when polysilicon gate doping decreases in a MOSFET?
A)Threshold voltage magnitude increases notablyโ
B)Drain current saturation velocity increases
C)Subthreshold swing maintains fixed value
D)Gate oxide leakage current is minimized
๐ก Explanation
Increased depletion region width at the gate interface due to insufficient doping results in larger voltage required to establish the channel โ a consequence of charge carrier starvation. Therefore, the threshold voltage magnitude increases rather than subthreshold swing being constant even with lower doping because the channel doping remains the same.
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