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Which outcome occurs when rapid oxide growth on a silicon carbide MOSFET gate?

A)Increased electron tunneling current occurs
B)Channel mobility is drastically decreased
C)Threshold voltage remains permanently stable
D)Minority carriers populate depletion zones

💡 Explanation

Increased electron tunneling current occurs because increased oxide thickness causes higher electric fields during operation. The Fowler-Nordheim tunneling mechanism allows electron flow, therefore higher current rather than decreased mobility, because threshold voltage shifts at high temperature.

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