VibraXX
Live Quiz Arena
🎁 1 Free Round Daily
⚡ Enter Arena
HomeCategoriesScienceQuestion
Question
Science

Which outcome reduces plasma etching rates despite fixed energy input?

A)Increased collisional deactivation of radicals
B)Elevated substrate temperature gradients
C)Decreased volatile byproduct formation
D)Enhanced ion bombardment substrate density

💡 Explanation

Increased pressure raises collision frequency, which enhances collisional deactivation of radicals, so reduces etching rates, because radicals are consumed before reacting with the substrate. Therefore, rates decline due to limited radical availability rather than increased energetic species reaching surface.

🏆 Up to £1,000 monthly prize pool

Ready for the live challenge? Join the next global round now.
*Terms apply. Skill-based competition.

⚡ Enter Arena

Related Questions

Browse Science