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Which outcome results when applying voltage and temperature constraints to silicon-based flash memory cells relying on floating gate transistors?

A)Increased program/erase cycle endurance
B)Data corruption due to electron tunneling
C)Improved overall data storage density
D)Reduced cell-to-cell interference effects

💡 Explanation

Data corruption increases because Fowler-Nordheim tunneling allows electrons to escape the floating gate over many read cycles when voltage is applied across it repeatedly; therefore, data is lost, rather than endurance improving under these constraints because stress accumulates over time.

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