Which property arises in semiconductor fabrication when annealing incomplete atomic layer deposition films?

💡 Explanation

Enhanced uniformity arises because surface diffusion minimizes the total surface energy; the driving mechanism being Ostwald ripening. Larger dots grow at the expense of smaller ones, therefore narrow size distributions result, rather than mobility or resistance improvements.

• Which risk increases when reflective facets misalign internally within a solid-state laser?
• Which risk increases when high molecular weight polymers undergo sonication?
• Which outcome occurs in selective catalytic reduction when ammonia slip exceeds recommended threshold?
• Which outcome occurs when unbound arsenic atoms diffuse into a silicon lattice used in semiconductor fabrication?
• Which outcome occurs when a Carbon-14 sample reaches equilibrium?
• Which risk increases when applying excessive voltage to a silicon-based tunnel diode?