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← TechnologyWhich risk increases to a microchip when electrostatic discharge exceeds junction capacity?
A)Gate oxide dielectric rupture✓
B)Increased channel length modulation
C)Substrate doping concentration shift
D)Reduced carrier mobility linearity
💡 Explanation
Gate oxide integrity fails because dielectric rupture occurs from exceeding breakdown voltage during electrostatic discharge (ESD). This provides direct current paths, therefore total chip failure occurs rather than other subtle parameter shifts caused by channel or doping variances under normal conditions.
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