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Which risk increases when a silicon ingot cools rapidly during Czochralski crystal growth?

A)Increased dislocation density from thermal stress
B)Reduced dopant segregation due to rapid solidification
C)Enhanced oxygen incorporation from crucible dissolution
D)Suppressed point defect formation due to undercooling

💡 Explanation

When a silicon ingot cools rapidly, thermal gradients induce stress because different parts shrink unevenly, increasing dislocations defects. Therefore dislocation density increases, rather than altered dopant segregation, oxygen incorporation, or point defect suppression, that relate more to equilibrium cooling.

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