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← ScienceWhich risk increases when electrons tunnel through MOSFET gate oxide?
A)Increased threshold voltage instability✓
B)Enhanced channel mobility variation
C)Elevated subthreshold swing deviation
D)Reduced drain-induced barrier lowering
💡 Explanation
Increased threshold voltage instability occurs because charge trapping via Fowler-Nordheim tunneling accumulates hot electrons and injects them into gate oxide defects; therefore causing threshold shift, rather than other effects related to carriers in the channel.
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