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Which risk increases when electrons tunnel through MOSFET gate oxide?

A)Increased threshold voltage instability
B)Enhanced channel mobility variation
C)Elevated subthreshold swing deviation
D)Reduced drain-induced barrier lowering

💡 Explanation

Increased threshold voltage instability occurs because charge trapping via Fowler-Nordheim tunneling accumulates hot electrons and injects them into gate oxide defects; therefore causing threshold shift, rather than other effects related to carriers in the channel.

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