Live Quiz Arena
🎁 1 Free Round Daily
⚡ Enter ArenaQuestion
← ScienceWhich risk increases within semiconductor devices using narrower channels?
A)Gate oxide electron tunneling✓
B)Increased electron band separation
C)Reduced electron lattice scattering
D)Enhanced polaron formation potential
💡 Explanation
Gate oxide electron tunneling becomes more prominent as channel lengths decrease because the insulating layer becomes very thin, therefore electrons can quantum tunnel, rather than being blocked; increased electron tunneling leads to leakage currents.
🏆 Up to £1,000 monthly prize pool
Ready for the live challenge? Join the next global round now.
*Terms apply. Skill-based competition.
Related Questions
Browse Science →- Which effect occurs when excessive mechanical stress breaks polymer's covalent bonds within adhesive layer securing aircraft panel?
- Which outcome results from exceeding a packed catalytic bed's pressure limit?
- Which outcome reduces strength when cyclic mechanical stress disrupts alumina grain bonds?
- Which outcome sharply CURTAILS nuclear fusion inside a collapsing star, if the increased density elevates electron capture rates on certain isotopes?
- Which issue arises when coupling high-power pulsed lasers into optical fibers?
- Which risk significantly increases as hydrogen embrittlement progresses?
