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Within an integrated circuit, which risk increases when electron trench isolation degrades?

A)Increased subthreshold leakage current
B)Reduced gate oxide breakdown voltage
C)Elevated junction temperature gradients
D)Enhanced channel carrier mobility

💡 Explanation

Increased subthreshold leakage occurs because the channel's energy barrier lowering effect is reduced due to less effective isolation. Increased leakage appears, rather than changes to gate voltage or carrier mobility, which depend on doping profiles; therefore, isolation issues directly affect leakage.

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