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Which consequence results when gate oxide scaling reaches its limit regarding electron confinement?

A)Increased transistor gate leakage current
B)Enhanced channel mobility saturation.
C)Decreased subthreshold swing voltage.
D)Reduced drain induced barrier lowering

💡 Explanation

Increased gate leakage is observed because as gate oxide thickness decreases, quantum tunneling becomes prominent, leading to electrons tunneling through the oxide layer, therefore increasing gate leakage current rather than influencing channel mobility due to scattering mechanisms.

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