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← ScienceWhich issue limits performance in double-gate MOSFETs when the gate oxide thins?
A)Increased electron quantum tunneling✓
B)Reduced carrier mobility overall
C)Higher channel thermal conductivity
D)Elevated gate dielectric breakdown
💡 Explanation
Increased electron leakage occurs because quantum tunneling permits electrons to pass through the gate oxide. The thin gate enhances tunneling probability; therefore, option A is right rather than dielectric breakdown or reduced mobility arising from different MOSFET limitations.
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