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Which mechanism governs the increasing electrical resistance observed when a silicon wafer is increasingly doped with boron?

A)Reduced electron-hole recombination rate
B)Increased density of impurity scattering
C)Augmented crystalline domain alignment
D)Enhanced free carrier concentration

💡 Explanation

Increased impurity doping enhances the Density of States and thus increases impurity scattering because more scattering centers are present causing more collisions and reducing electron mobility, therefore resistance goes up. Rather than reduced recombination rates causing less change to free carriers under bias.

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