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← ScienceWhich mechanism limits drain current as MOSFET gate oxide thickness decreases?
A)Quantum tunneling leakage increases exponentially✓
B)Thermal runaway destroys the gate
C)Channel length modulation induces breakdown
D)Contact resistance limits achievable conductance
💡 Explanation
As gate oxide thins, electrons tunnel through the insulating layer due to quantum tunneling, because the barrier width reduces; therefore leakage dramatically escalates, rather than thermal or channel effects dominating at these extremes.
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