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Which mechanism limits drain current as MOSFET gate oxide thickness decreases?

A)Quantum tunneling leakage increases exponentially
B)Thermal runaway destroys the gate
C)Channel length modulation induces breakdown
D)Contact resistance limits achievable conductance

💡 Explanation

As gate oxide thins, electrons tunnel through the insulating layer due to quantum tunneling, because the barrier width reduces; therefore leakage dramatically escalates, rather than thermal or channel effects dominating at these extremes.

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