VibraXX
Live Quiz Arena
🎁 1 Free Round Daily
⚡ Enter Arena
HomeCategoriesScienceQuestion
Question
Science

Which outcome increases within a semiconductor's gate oxide layer under high electric field stress?

A)Electron tunneling probability
B)Capacitance density plateau
C)Dielectric breakdown voltage
D)Minority carrier concentration

💡 Explanation

Increased field stress enhances **quantum tunneling** through the gate oxide, because the thinner the barrier implies greater probability of electron penetration; therefore enhanced electron tunneling leakage occurs, rather than increased capacitance because different mechanisms dictate the phenomena.

🏆 Up to £1,000 monthly prize pool

Ready for the live challenge? Join the next global round now.
*Terms apply. Skill-based competition.

⚡ Enter Arena

Related Questions

Browse Science