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Which outcome occurs in transistor gate insulators when oxide thickness decreases?

A)Increased quantum tunneling probability
B)Decreased gate leakage current
C)Enhanced dielectric breakdown strength
D)Reduced channel mobility degradation

💡 Explanation

Increased quantum tunneling probability results because decreasing the potential barrier width allows carriers to tunnel through the gate oxide through quantum tunneling, therefore increasing leakage current, rather than preventing conduction due to thicker insulators.

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