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← ScienceWhich outcome occurs when graphite experiences high temperature plasma etching in semiconductor fabrication?
A)Formation of volatile carbon fluorides✓
B)Amorphous carbon recrystallization into diamond
C)Intercalation compound formation with etchants
D)Graphitic oxide layer inhibiting further etching
💡 Explanation
When graphite is exposed to high temperature plasma etching, reactive fluorine radicals abstract carbon atoms, forming volatile carbon fluorides because the covalent carbon-carbon bonds in graphite are broken. Therefore, volatile carbon fluorides are formed, rather than recrystallization, intercalation, or oxidation which require different thermodynamic conditions or presence of other reactants.
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