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Which outcome occurs when plasma etchers lack sufficient radio frequency energy?

A)Slower, anisotropic etching
B)Accelerated, isotropic etching
C)Polymer deposition increases
D)Chamber pressure plateaus

💡 Explanation

Polymerization increases with lowered RF because insufficient energy causes less etchant generation, so surface polymerization occurs, rather than etching. Therefore, polymer deposition will dramatically increase rather than etching, because polymer byproducts won't be ionized.

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