Which outcome sharply increases the etching rate as photoresist diminishes?

💡 Explanation

Reactive ion etching rate increases dramatically at pinholes as the photoresist erodes because increased plasma exposure accelerates etching through these thin spots, therefore a breakthrough event occurs rather than steady uniform material removal.

• Which mechanism dictates stabilized reaction rates when enzyme concentration doubles?
• Which consequence results when gravitational equipotential surfaces concentrate around a black hole?
• Which mechanism increases wave damping of offshore platforms?
• Which effect occurs in a gallium arsenide FET when bias exceeds velocity saturation?
• Which mechanism reduces the energy needed for hydrolysis in enzymatic reactions?
• Which consequence results when Schrodinger equation solutions diverge?