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Which process limits electron tunneling current density in practical flash memory cells during a write operation?

A)Coulomb blockade suppressing electron flow
B)Phonon scattering reducing electron momentum
C)Space charge buildup inhibiting tunneling
D)Interface trap states capturing electrons

💡 Explanation

When electrons tunnel into the floating gate, space charge buildup occurs because the injected electrons repel further incoming electrons, inhibiting the tunneling rate and limiting the current density during the write operation. Therefore, space charge buildup limits current, rather than blockade, scattering or trapping, which affect transport through different mechanisms.

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