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Which risk develops due to decreasing beam coherence in semiconductor lithography?

A)Reduced feature resolution arises.
B)Substrate adheres poorly to masks.
C)Photoresist forms weak binding sites.
D)Increased lens thermal aberrations ensue.

💡 Explanation

Reduced coherence impairs the ability to produce sharp interference patterns for fabricating fine features because imperfect superimposition weakens resolution. Therefore, feature resolution lowers, rather than resist failure which is dependent on chemical effects.

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