Which risk increases when a laser etching system exceeds duty cycle limits?

💡 Explanation

Thermal runaway risk increases because absorption exceeds dissipation, driving exponential temperature gains— the process of positive feedback. This causes irreversible component failure, therefore thermal runaway rather than pattern distortion due to imperfect beam alignment.

• Which consequence results when two entangled photons pass optical fibers under differential stress?
• Which effect occurs when applying intense pressure to germanium?
• Which mechanism governs current flow through gate oxide layers thinner than 3 nanometers in MOSFET transistors?
• Which outcome occurs more intensely near dense objects, exhibiting the principle of equivalence?
• Which outcome occurs when a refrigerant undergoes rapid phase transition in a vapour-compression refrigeration system?
• Which risk increases when applying excessive voltage across a MOSFET gate?