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Which risk increases when a nanoscale flash memory cell's oxide layer degrades?

A)Increased quantum tunneling current
B)Reduced cell polarization efficiency
C)Elevated thermal runaway threshold
D)Decreased electron trap density

💡 Explanation

Increased quantum tunneling is likely because the thinner oxide layer increases the probability of electrons tunneling through the barrier. Therefore, current leakage increases, rather than trapping efficiency increasing or relating to thermal effects, because oxide integrity weakens.

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