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Which thermal runaway risk increases when MOSFETs experience prolonged gate overvoltage?

A)Channel inversion layer formation
B)Increased oxide layer conduction
C)Substrate carrier concentration decrease
D)Enhanced gate capacitance coupling

💡 Explanation

Increased oxide layer conduction can occur because high gate voltage causes Fowler-Nordheim tunneling through the gate oxide. This tunneling increases gate current and power dissipation; therefore temperature rises, further increasing conduction, rather than stabilizing.

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