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Which consequence results when a plasma etcher's chamber walls catalyse radical recombination?

A)Increased substrate etch isotropy
B)Reduced effective etch rate
C)Enhanced micro-loading effect
D)Improved feature profile uniformity

💡 Explanation

Reduced effective etch rate happens because surface recombination depletes etchant radicals; this decreases the radical concentration at the substrate surface, therefore the etch rate diminishes, rather than causing profile changes.

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